History

1990 Feb.

Established with capital of 5 million yen (Shinke-cho, Sakai, Osaka)

Aug.

Developed first exhaust gas treatment system “TLV-AF”

Oct.

Developed powder removal system

1991 Jan.

Developed fully automatic type exhaust gas treatment system “TLV-AFN”

Feb.

Increased capital to 20 million yen

May.

Developed low-cost type exhaust gas treatment system “TLV-M-AN” and “TLV-MW-AF”

1992 Jan.

Completed maintenance plant

Feb.

Completed fully automatic compact type exhaust gas treatment system “TLV-AFNX”

1994 Apr.

Completed new head office building (Higashiyama, Sakai, Osaka)

May.

Developed export model exhaust gas treatment system “TLV-AFCX” and “TLV-AFCWX”
Established New Technology Co., Ltd. (affiliated company)

1995 Feb.

Increased capital to 50 million yen

June.

Opened Kyushu sales office (Kikuyo-cho, Kikuyo-gun, Kumamoto)
Established Clean Technology Korea Co., Ltd. in Incheon, Korea

Aug.

Established Clean Maintenance Co., Ltd. (affiliated company)

Nov.

Completed head office building expansion (Higashiyama, Sakai, Osaka)
Completed Fukai plant

1996 Apr.

Moved Clean Technology Korea Co., Ltd. to Suson, Korea and completed plant

Oct.

Developed fluorocarbon treatment system and wet scrubber

Nov.

Developed
exhaust line filter unit “Bariatron”
automatic pipe cleaning system “Ductron”
powder vacuum unit “Serpens”

Dec.

Opened Kanto sales office (Toma, Sagamihara, Kanagawa)

1999 May.

Developed exhaust gas treatment system for dry etching “Technoclean”
Started in-house development of reagent for dry type exhaust gas treatment system

2000 Jan.

Developed heater type exhaust gas treatment system “Sirius”
Developed wet type exhaust gas treatment system “Aqua”

Feb.

Developed exhaust gas switching unit “Technochanger”

Dec.

Developed wet type exhaust gas treatment system “Aqua II”

2001 July.

Developed in-pipe coating “CT Coat”

Sep.

Developed jacket type heater for piping “CT Jacket”

2002 Jan.

Developed heater type exhaust gas treatment system “Sirius PA”

Dec.

Developed wet type exhaust gas treatment system “Aqua III”

2003 Mar.

Moved Kanto sales office (Higashinaruse, Isehara, Kanagawa)

2004 Sep.

Developed heater type exhaust gas treatment system “Sirius Kaiser”

2005 Dec.

Developed under water cleaner for semiconductor “Aqua Clean”

2006 May.

Developed VOC treatment system for semiconductor “Regulus”

Dec.

Developed plasma type exhaust gas treatment system “Thunder”

2007 Apr.

Developed heater type exhaust gas treatment system “Sirius Kaiser Neo”

May.

Completed and moved new company building (Hineno, Izumisano, Osaka)
Developed heater type exhaust gas treatment system “Sirius Printz”

2008 Feb.

Certification of ISO 9001 and 14001

Aug.

Developed heater type exhaust gas treatment system “Sirius Kaiser Gigant”

Dec.

A merger of Clean Technology Co., Ltd. and New Technology Co., Ltd.
Capital increased to 60 million yen

2009 Oct.

Developed heater catalyst type exhaust gas treatment system “Nite Clean”

2011 Nov.

Moved Kyushu sales office (Otsu-cho, Kikuchi-gun, Kumamoto)

2013 Apr.

Developed heater type exhaust gas treatment system “Sirius Kaiser Oz”

2015 Jul.

Developed plasma type exhaust gas treatment system “Lufock”

2016 Sep.

Developed plasma type exhaust gas treatment system “Dual Thunder”

2017 Apr.

Developed heater type exhaust gas treatment system “Sirius Kaiser Oz II”

Jun.

Developed wet type powder treatment system “Cotol”

2019 May.

Introduced a stand-alone model of “Cotol” to the market

2020 Jan.

Expansion of production site of 3rd floor of head office

Jun.

Established New Technology Co., Ltd. (subsidiary)

2021 Jun.

Opened Nagasaki sales office

Sep.

Moved Kanto sales office

2022 Jan.

Opened Miyagi sales office

May.

Established Clean Technology America, Inc.

2024 Jul.

Moved head office (3-2 Rinku Minamihama Sennan, Osaka)